PHOTO
Intel believes using germanium is important because, unlike silicon, it can efficiently detect light in the near infrared, which is the standard for communications. One of its drawbacks, however, is that so much stress is developed in pure germanium films deposited on silicon that defects are more likely within a germanium/silicon interface. At Intel's photonics labs, researchers are looking at different designs and processes that will minimise the impact of these defects on the electrical performance of the devices.
