Chipmakers on fast track to 10GHz
News The Extreme Ultraviolet LLC, a joint development effort charged with developing next-generation chip-manufacturing technology, recently built its first chip-manufacturing machine using the extreme ultraviolet lithography (EUV) process.
[January 16, 2001, 14:45]
Moore's Law on course for another two years
News However, it appears that extreme ultraviolet lithography, a future chipmaking technology championed by Intel, may get delayed. According to Intel, extreme ultraviolet lithography is "more likely for 22nm" manufacturing, which starts in 2011.
[January 26, 2006, 9:15]
Chip designers' Dream Team: 10GHz or bust
News As general manager and program director of the Extreme Ultraviolet LLC consortium, this 60-something executive directs the research and development efforts of a 150-member team of engineers cherry-picked from the Lawrence Livermore and Sandia...
[February 15, 2001, 14:36]
Intel draws chips with extreme UV
News The chipmaker plans to reveal on Monday that it has installed the first commercial extreme ultraviolet light photolithography tool in a development facility on its Hillsboro, Oregon, campus. EUV lithography tools also rely on ultraviolet light...
[August 2, 2004, 8:30]
Intel: One step closer to 10GHz
News The chipmaker announced Thursday that it has delivered the first standard-format photomasks for use with Extreme Ultraviolet (EUV) lithography. Because of EUV's relatively smooth road to development, most industry experts believe the technology...
[March 9, 2001, 8:38]
Thursday
Blog On the way out of the keynote, I'm handed a keyring containing a small scrap of nanotechnology -- an extreme-ultraviolet reflective mirror made from eighty layers of metal ten or fifteen atoms thick. I bellowed, and presented myself with extreme...
[September 13, 2002, 18:02]
Coalition shows off process for faster chips
News Extreme ultraviolet (EUV) lithography, showcased at a press conference at Lawrence Livermore National Laboratory on Wednesday, will allow chip manufacturers to "draw" circuits as small as 10 nanometres wide.
[April 12, 2001, 13:42]
Intel uses EUV tool to speed chips
News The new tool uses Extreme Ultraviolet Lithography (EUV) to print extremely small circuit patterns on chips, resulting in smaller features that let chipmakers pack many more transistors onto their semiconductors.
[April 23, 2002, 8:22]
Intel shows off next-generation production tricks
News After that, said Bohr, new techniques using extreme ultraviolet would be needed. Intel has announced its first test production of four-megabit static memories using 65-nanometre technology. This marks a key stage in the company's preparation for...
[November 24, 2003, 20:25]
Molecules draw straight line
News The MRSEC team managed to draw two different types of alternating lines into silicon wafers through extreme ultraviolet (EUV) lithography. Researchers at the University of Wisconsin have come up with a way to organise molecules through lithography...
[July 24, 2003, 7:54]
IBM saves chipmaking kit from an early bath
News In the past decade, Intel — along with AMD and to a lesser extent IBM — has promoted extreme ultraviolet lithography (EUV). IBM Research has come up with a way to draw lines in silicon 29.9nm apart with existing chipmaking machines, far closer than...
[February 20, 2006, 15:35]
Intel to reveal chip-packing breakthrough
News As a result, packaging research ranks up with the company's work on Extreme Ultraviolet (EUV) lithography, copper interconnects and transistor speed, Banerjee said. Chip packaging is arcane, often overlooked and absolutely crucial to the future of...
[October 8, 2001, 10:06]
Intel to unveil nanotech plans
News Subsequently, the decade will see the emergence of new types of packaging that will solve the problem of channeling substantial amounts of power into small chips, the use of optical technology inside computers and the emergence of Extreme...
[September 4, 2002, 13:48]
The problems of processor manufacture
News We haven't closed the door to EUV [Extreme Ultraviolet]. We work in probabilities, we're large enough to have dry, wet and DUV [Deep Ultraviolet]. He describes what he does as long-range research. I'm very happy when after ten or 15 years I see an...
[March 10, 2006, 17:05]
Moore's Law to roll on for another decade
News Extreme Ultraviolet (EUV) lithography uses light with much smaller wavelengths and will start to come onto the market in 2007. Engineers then switched to ultraviolet light. Another decade is probably straightforward," Moore said, speaking at the...
[February 11, 2003, 7:59]
Merger approval paves way for faster chips
News The next-generation lithography technique chosen by Intel, extreme ultraviolet (EUV), will allow the manufacture of chips with geometry of 0.07 microns and below, and running at 10GHz and faster. The advanced tools will become even more important...
[May 3, 2001, 13:06]
IDF: Where no chip has gone before
News Sometime in the decade, Extreme Ultraviolet (EUV) lithography will replace conventional lithography. The nanotechnology era is here, and Intel is looking at all the options. On Thursday, at its Developer Forum in San Jose, The Santa Clara...
[September 13, 2002, 7:46]
